For gas flow control at your vacuum system, a comfortable and clearly arranged control device is required?
Do you use different gases and gas mixtures for your processes? Therefore you are looking for a convenient and reliable solution, sustaining mixture ratios of process gases while changing the volume flow?
By using our four-channel flow controller FCU-4 from our product series JEVAflow®, a versatile and technical equivalent to the ROD-4 from Hitachi Metals control device, developed by JEVATEC GmbH, awaits you. On request, we are offering a suitable MFC for your application.
■ control unit for up to four analog or digital MFCs
■ clearly legible 4-digit LED display and status display for every channel
■ display and entering of the flow values in % within the measuring range or in slm/sccm
■ controlling via front keybord or serial interface RS 232
■ Master/Slave function
■ One analog output per channel
■ Two relays per channel for process controlling as well as valve controlling
■ Wide-range power supply for worldwide operation
■ Rack slot 19”, 2 height units
Did we spark your interest?
Please find more information at the data sheet or in the manual in our download area.
The prices can be found in the price list, which you will also find in our download area.
Get in contact with us. We are looking forward to answer your questions or make you an offer.